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The effect of laser parameters (frequency and fluency) on the optical and structural characteristics of ZnO films deposited by PLD method | ||
| Journal of Interfaces, Thin Films, and Low dimensional systems | ||
| دوره 4، شماره 1، بهمن 2020، صفحه 331-338 اصل مقاله (1.66 M) | ||
| نوع مقاله: Original Article | ||
| شناسه دیجیتال (DOI): 10.22051/jitl.2021.37048.1058 | ||
| نویسندگان | ||
| Faezeh Hassani1؛ Batool Sajad* 1؛ Seyede Soraya Mousavi2؛ Mehrnaz Simdar1؛ Mohammad Amin Bassam3 | ||
| 1Departments of physics, Faculty of Physics and Chemistry, Alzahra University, Tehran, Iran | ||
| 2Departments of Physics, Faculty of Physics and Chemistry, Alzahra University, Tehran, Iran | ||
| 3Physics Department, Malek-Ashtar University of Technology, Lavizan, Tehran, Iran | ||
| چکیده | ||
| The pulsed laser deposition is a practical synthesis route because of its unique advantages in growing various materials. Furthermore, the quality of thin films depends on different parameters in the deposition process. Meanwhile, ZnO has many applications in manufacturing optics, electronics, and optoelectronics instruments because of its exclusive properties. We have set up a PLD array to deposit the ZnO thin films on glass substrates. This study investigates the structural and optical characteristics of the films deposited at two different pulse repetition rates. Based on the optical-microscopic images and the scanning electron microscope (SEM) micrographs of films, increasing pulse repetition rate increases the uniformity of the particle size distribution and enhances film thickness. Also, the optical characterization performed by UV-Visible spectroscopy shows that the absorption and transmission rate, bandgap energy, and crystalline quality of the films can adjust by tuning the pulse repetition rate. | ||
| کلیدواژهها | ||
| Pulsed Laser Deposition؛ Pulse Repetition Rate؛ Optical properties؛ Morphological Structure؛ Laser Fluency | ||
| عنوان مقاله [English] | ||
| تاثیر پارامترهای لیزر (فرکانس و شاریدگی) بر مشخصه های نوری و ساختاری لایه های اکسید روی رسوب داده شده به روش رسوب لیزر پالسی | ||
| نویسندگان [English] | ||
| فائزه حسنی1؛ بتول سجاد1؛ سیده ثریا موسوی2؛ مهرناز سیمدر1؛ محمد امین بسام3 | ||
| 1گروه فیزیک، دانشکده فیزیک و شیمی، دانشگاه الزهرا، ایران | ||
| 2گروه فیزیک، دانشکده فیزیک و شیمی، دانشگاه الزهرا، ایران | ||
| 3گروه فیزیک، دانشگاه صنعتی مالک اشتر، لویزان، تهران، ایران | ||
| چکیده [English] | ||
| لایهنشانی لیزر پالسی به دلیل مزیتهای منحصر به فردی که در رشد مواد مختلف دارد یک روش سنتز کارآمد است. علاوه بر این کیفیت لایههای نازک به پارامترهای مختلف فرآیند لایهنشانی بستگی دارد. ضمن این که اکسید روی به خاطر ویژگیهای منحصر به فردش کاربردهای فراوانی در ساخت ادوات اپتیکی، الکترونیکی و الکترواپتیکی دارد. ما یک چیدمان لایهنشانی لیزر پالسی را برپا کردهایم تا لایههای نازک ZnO را روی زیرلایههای شیشهای انباشته کنیم. این پژوهش مشخصههای ساختاری و اپتیکی لایههای انباشته شده با دو نرخ تکرار پالس متفاوت را بررسی میکند. براساس عکسهای میکروسکوپ اپتیکی و میکروگرافهای میکروسکوپ الکترونی روبشی SEM)) به دست آمده از لایهها افزایش نرخ تکرار پالس، یکنواختی توزیع اندازه ذرات را افزایش میدهد و ضخامت لایه را بیشتر میکند. همچنین مشخصههای اپتیکی که به کمک اسپکتروسکوپی مرئی- فرابنفش بررسی شده، نشان میدهد نرخ جذب و عبور، گاف انرژی و کیفیت کریستالی لایهها با تغییر نرخ تکرار پالس قابل تنظیم است. | ||
| کلیدواژهها [English] | ||
| لایهنشانی لیزر پالسی, نرخ تکرار پالس, اکسید روی, ویژگیهای اپتیکی, ساختار مورفولوژی, شاریدگی لیزر | ||
| مراجع | ||
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